X-ray photoelectron spectroscopy studies of the reaction of N+2 -ion beams with niobium and tantalum metals

Abstract

I n situ nitrogen-ion implantation of polycrystalline niobium and tantalum was performed and the surface was characterized by x-ray photoelectron spectroscopy (XPS). The XPS chemical shifts indicated the formation of metal nitride. The chemical shift values are calculated theoretically and compared with the experimental values.