Long-wavelength fast semiconductor saturable absorber mirrors using metamorphic growth on GaAs substrates

Abstract

Metamorphic growth of InP on GaAs has been used to decrease the absorption recovery time of 1.55μm semiconductor saturable absorber mirrors. We show that the recovery time can be reliably controlled by changing the thickness of an InP “lattice reformation layer” grown between the GaAs-based distributed Bragg reflector and the active region. Semiconductor saturable absorber mirrors with a thickness of the InP reformation layer around 200 nm or smaller exhibit a recovery time short enough to reliably mode-lock fiber lasers.