Micropatterning of a single layer of nanoparticles by lithographical methods with diblock copolymer micelles

Abstract

We have demonstrated micropatterning of a single layer of nanoparticles by combining a self-assembly of diblock copolymer micelles with conventional and soft lithographical methods. On a photoresist micropattern fabricated by conventional photolithography, a single layer of diblock copolymer micelles containing precursors of nanoparticles was spin-coated. By plasma and lift-off processes, nanoparticles with the preservation of a pseudo-hexagonal order of micelles were synthesized in the micropattern without their aggregation. In addition, soft lithography of the microcontact printing technique was combined with the process of diblock copolymer micelles to produce micropatterns of nanoparticles. As an ink of the microcontact printing process, a single-layered film of diblock copolymer micelles was spin-coated directly onto the stamp and then transferred on the substrate by stamping. Formation of a single layer of nanoparticles in the micropattern was carried out by plasma treatment.