Publication | Closed Access
Optical constants for thin films of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Ir, Os, Pt, and Au from 24 Å to 1216 Å
130
Citations
16
References
1988
Year
Optical MaterialsEngineeringElectron-beam LithographyElectron DiffractionThin Film Process TechnologySpectroscopic PropertyChemical EngineeringElectron SpectroscopyOptical PropertiesInstrumentationThin Film ProcessingMaterials ScienceSample CompositionSurface CharacterizationIncident Beam PolarizationMaterial AnalysisSpectroscopyFilm ThicknessesApplied PhysicsSurface AnalysisThin FilmsOptical Constants
Reflectance vs incidence angle measurements have been performed from 24 A to 1216 A on electron-beam evaporated samples of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Os, Ir, Pt, and Au, and using a nonlinear least-squares curve-fitting technique, the optical constants have been determined. Independently measured values of the incident beam polarization, film thicknesses, and film surface roughnesses are incorporated into the derivation of the optical constants. Additionally, Auger electron spectroscopy depth profiling measurements have been performed on each sample to characterize sample composition including oxidation and contamination.
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