Journal of Applied Physics · 1966 · 33 citations · 11 references
Natural SciencesMaterials SciencePhysicsElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsSemiconductor Crystal GrowthThin-film DepositionQuartz Crystal MicrobalanceSputter DepositionSputteringSputtering ProcessesSputtering TechniquesTarget Dry Weight
Sputtering yields of single crystals of SiC, InSb, GaAs, GaP, CdS, and PbTe under argon ion bombardment have been measured. The energy of the argon ions, obtained from a magnetically confined argon arc, ranged from 75 to 600 eV. The sputtering yields were determined from target weight losses measured by an in situ quartz spring microbalance. Yields at 500-eV argon ion energy ranged from 0.40 for SiC to 1.30 for PbTe.
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