Publication | Open Access
Vacancy-mediated dopant diffusion activation enthalpies for germanium
140
Citations
30
References
2008
Year
Impurity AtomsEngineeringDiffusion ResistancePhysicsNatural SciencesIntrinsic ImpurityApplied PhysicsQuantum MaterialsActivation EnthalpiesSemiconductor MaterialElemental MetalQuantum ChemistryChemistryActivation EnthalpyElectronic StructureCompound SemiconductorGermanene
Electronic structure calculations are used to predict the activation enthalpies of diffusion for a range of impurity atoms (aluminium, gallium, indium, silicon, tin, phosphorus, arsenic, and antimony) in germanium. Consistent with experimental studies, all the impurity atoms considered diffuse via their interaction with vacancies. Overall, the calculated diffusion activation enthalpies are in good agreement with the experimental results, with the exception of indium, where the most recent experimental study suggests a significantly higher activation enthalpy. Here, we predict that indium diffuses with an activation enthalpy of 2.79eV, essentially the same as the value determined by early radiotracer studies.
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