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High-mobility Sb-doped p-type ZnO by molecular-beam epitaxy
314
Citations
30
References
2005
Year
Materials ScienceSemiconductorsSb DopantElectronic DevicesMolecular-beam EpitaxyEngineeringOxide ElectronicsOptoelectronic MaterialsApplied PhysicsSb FilmsSemiconductor MaterialOptoelectronic DevicesMolecular Beam EpitaxyCompound SemiconductorExcellent DopantSemiconductor Nanostructures
Reproducible Sb-doped p-type ZnO films were grown on n-Si (100) by electron-cyclotron-resonance-assisted molecular-beam epitaxy. The existence of Sb in ZnO:Sb films was confirmed by low-temperature photoluminescence measurements. An acceptor-bound exciton (A°X) emission was observed at 3.358 eV at 8 K. The acceptor energy level of the Sb dopant is estimated to be 0.2 eV above the valence band. Temperature-dependent Hall measurements were performed on Sb-doped ZnO films. At room temperature, one Sb-doped ZnO sample exhibited a low resistivity of 0.2Ωcm, high hole concentration of 1.7×1018cm−3 and high mobility of 20.0cm2∕Vs. This study suggests that Sb is an excellent dopant for reliable and reproducible p-type ZnO fabrication.
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