Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications - Concepedia

Concepedia

Publication | Open Access

Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications

DOI Full Paper Access

38

Citations

24

References

2006

Year

M.G. Hussein, Kerstin Wörhoff, G. Sengo, A. Driessen

Thin Solid Films

Materials ScienceOptical MaterialsEngineeringIntegrated Optics ApplicationsOptical PropertiesApplied PhysicsVacuum DeviceSilicon On InsulatorPlasma ProcessingPlasma EtchingOptoelectronicsChemical Vapor Deposition

References

	Year	Citations

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