Publication | Closed Access
Method for Controlled Multicomponent Sputtering
17
Citations
2
References
1962
Year
EngineeringControlled MulticomponentTarget FabricationAdvanced ManufacturingComputer-aided DesignChemical DepositionParticle TechnologyElectrochemical InterfaceElectrode Reaction MechanismAlloy FilmsThin Film ProcessingMaterials ScienceElectrical EngineeringComputer EngineeringReactive SputteringElectrochemistrySurface ScienceProcess ControlIndependent Electrodes
A method for sputtering simultaneously from electrically independent electrodes is described. The important design consideration is that the electrodes (cathodes) are enveloped by a single Crooke's dark space. Using this technique, alloy films (or in the case of reactive sputtering, mixed compound films) can be obtained. Since the electrodes are independent, the composition gradient (in depth) of the film can be varied at will by proper variation of applied voltages.
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