Publication | Closed Access
Band alignment and interfacial structure of ZnO/Ge heterojunction investigated by photoelectron spectroscopy
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Citations
27
References
2012
Year
Optical MaterialsEngineeringZno LayersOptoelectronic DevicesSemiconductor NanostructuresSemiconductorsIi-vi SemiconductorElectronic DevicesCompound SemiconductorMaterials ScienceOxide HeterostructuresValence Band OffsetOxide ElectronicsOptoelectronic MaterialsGallium OxideSemiconductor MaterialBand AlignmentPhotoelectron SpectroscopyZno/ge HeterojunctionApplied PhysicsThin FilmsOptoelectronicsZno Thin Films
Studies on band-offset and band-alignment of heterojunction of highly c-axis oriented ZnO thin films grown on n-Ge (1 1 1) by pulsed laser deposition show a type-II band alignment with the valence band offset (ΔEV) of 3.1 ± 0.2 eV. The valence band spectra of this heterojunction show band onsets corresponding to Ge, interfacial GeOx, and ZnO layers. This observation also enabled us to determine ΔEV of ZnO/GeOx heterojunction to be 1.4 ± 0.2 eV. These studies provide further insight into the band alignment of ZnO/GeOx/Ge system wherein the observed large value of ΔEV of ZnO/Ge can be used for heterojunction based optoelectronic devices.
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