Publication | Closed Access
Growth of Sb and InSb by molecular-beam epitaxy
128
Citations
8
References
1981
Year
EngineeringCrystal Growth TechnologyFree AntimonySurface LifetimeSemiconductor NanostructuresSemiconductorsIi-vi SemiconductorMolecular-beam EpitaxyMolecular Beam EpitaxyEpitaxial GrowthDesorption Activation EnergyMaterials ScienceMaterials EngineeringCrystalline DefectsPhysicsSemiconductor MaterialSurface ScienceApplied PhysicsCondensed Matter PhysicsThin Films
The temperature dependence of the surface lifetime of free antimony on InSb has been determined using 10-kV reflection electron diffraction (RHEED). A desorption activation energy was extracted from these data and found to have a value of 64.2±3 K cal/mole which is within experimental error of ΔH (sublimation) for monatomic Sb. At substrate temperatures of 280 °C, it was possible to nucleate antimony in an epitaxial relationship with (111)A- and (111)B-oriented InSb surfaces; subsequent epitaxial growth could continue at temperatures as low as 40 °C. Films of InSb were grown homoepitaxially on (111)A-, (111)B-, and (001)-oriented InSb substrates and heteroepitaxially on (001)-oriented InAs and GaAs over a wide temperature range, 280 °<T<450 °C. Surface-atom reconstructions for Sb-stabilized and In-stabilized films are identified.
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