Applied Physics Letters · 1981 · 194 citations · 4 references
Natural SciencesMaterials SciencePhysicsPhase TransformationsPlasma PhysicsSurface ScienceLaser PhysicsLaser-plasma InteractionsSemiconductor PhysicsSemiconductor SurfacesSilicon MaterialsUltrafast OpticsAnnealingFemtosecond Laser PulsesPhase Transformation AnalysisReflectivityThermalizationUltrafast Carrier DynamicsUltrafast Laser Material ProcessingUltrafast Optical Response
Ultrafast melting and resolidification on a (111) sufarce of a silicon crystal wafer, induced by 20-ps pulses at 532-nm wavelength, is accompanied by the emission of charged particles. This emission is studied as a function of pulse energy, in combination with time-resolved reflectivity changes and post-annealing morphology. The data provide evidence that thermalization time for a dense carrier plasma and the lattice is shorter than 10−11 s.
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Picosecond laser-induced melting and resolidification morphology on Si
P. L. Liu, R. Yen, N. Bloembergen et al. · Applied Physics Letters · 1979 · 325 citations
Natural Sciences, Materials Engineering, Materials Science +17
cw argon laser annealing of ion-implanted silicon
D. H. Auston, J. A. Golovchenko, P. R. Smith et al. · Applied Physics Letters · 1978 · 91 citations
On laser annealing and lattice melting
W. P. Dumke · Physics Letters A · 1980 · 31 citations