Surfactant-Induced Layer-by-Layer Growth on a Highly Anisotropic Substrate: Co/Cu(110)

Abstract

Using thermal energy helium atom scattering it is found that deposition of cobalt on the $\mathrm{Cu}(110)\ensuremath{-}(2\ifmmode\times\else\texttimes\fi{}1)\mathrm{O}$ surface at 350 K leads to layer-by-layer growth of a pseudomorphic fcc(110) Co film. Auger electron spectroscopy reveals that the surface is O terminated even after deposition of more than 20 monolayer Co. A $(3\ifmmode\times\else\texttimes\fi{}1)$ superstructure is observed in the topmost Co layer, suggesting that the Co(110) phase is stabilized by an oxygen induced surface reconstruction.