Journal of Applied Physics · 1998 · 61 citations · 19 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsSpectroscopyDopingSemiconductor Device MaterialsSemiconductor PhysicsWide Band Gap SemiconductorsWide-bandgap Semiconductor DevicesWide-bandgap SemiconductorsConduction BandExcitationGallium Nitride (Gan) MaterialsMetalorganic Chemical Vapor DepositionPhotoluminescencePhotoluminescence SpectroscopyValence BandValence Band Structure
We have grown Mg-doped GaN films by metalorganic chemical vapor deposition with various CP2Mg flow rates. After 750 °C postgrowth annealing, p-type GaN films with carrier concentrations and mobilities about 2×1017/cm3 and 10 cm2/V s, respectively, have been achieved. A dominant photoluminescence (PL) line around 2.9 eV was observed at room temperature. By studying the dependence of PL on excitation density at 20 K, the emission line around 2.95 eV can be attributed to a donor-to-acceptor pair transition rather than to a conduction band-to-impurity transition involving the Mg-related deep level. We suggest that the DAP transition line is caused by a Mg related deep level at about 510 meV above the valence band. It is much deeper than the acceptor level at 250 meV commonly produced by the Mg dopants.
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Optical Processes in Semiconductors
J. I. Pánkové, D. A. Kiewit · Journal of The Electrochemical Society · 1972 · 4.6K citations
Thermal Annealing Effects on P-Type Mg-Doped GaN Films
Shuji Nakamura, Takashi Mukai, Masayuki Senoh et al. · Japanese Journal of Applied Physics · 1992 · 1.1K citations
Hole Compensation Mechanism of P-Type GaN Films
Shuji Nakamura, Naruhito Iwasa, Masayuki Senoh et al. · Japanese Journal of Applied Physics · 1992 · 1.1K citations