Publication | Closed Access
Photoluminescence properties of ZnSe single crystalline films grown by atomic layer epitaxy
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Citations
9
References
1986
Year
Optical MaterialsEngineeringAtomic Layer EpitaxyOptoelectronic DevicesSemiconductor NanostructuresSemiconductorsIi-vi SemiconductorElectronic DevicesGaas SubstratesMolecular Beam EpitaxyPhotoluminescence PropertiesEpitaxial GrowthCompound SemiconductorMaterials SciencePhotoluminescenceOptoelectronic MaterialsFeatureless Surface TextureApplied PhysicsThin FilmsOptoelectronics
Atomic layer epitaxy has been employed to produce good-quality ZnSe single crystalline films onto (100) oriented GaAs substrates. The epilayers grown at 280 °C exhibited smooth and featureless surface texture and excellent photoluminescence characteristics. They showed dominant excitonic emission lines and a very weak deep center emission band.
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