On the possibility of electron-beam processing of dielectrics using a forevacuum plasma electron source

Abstract

An insulated target was irradiated by an electron beam generated by a forevacuum plasma electron source operating in the pressure range of 5–15 Pa. Measurements of the target potential showed that plasma formed in the region of electron beam transport ensured the almost complete neutralization of charge accumulated on the target. This effect results in the possibility of direct electron-beam processing of nonconducting materials, including the melting and welding of ceramics.