Publication | Closed Access
Influence of Adsorbate Ordering on Rates of UV Photooxidation of Self-Assembled Monolayers
149
Citations
43
References
1996
Year
EngineeringSelf-assembled MonolayersOxidation ResistanceChemistryChain AlkylthiolUv PhotooxidationChemical EngineeringPhotocatalysisRedox ChemistryPhotochemistryNanotechnologyMechanistic PhotochemistryThiolate GroupAdsorbate OrderingAdsorptionPhotodegradationSurface FunctionalizationSurface ChemistrySelf-assemblySurface ScienceAlkyl Chain Length
The photooxidation of a range of methyl terminated straight chain alkylthiol (CH3(CH2)n-1SH) self-assembled monolayers (SAMs) on Au has been investigated using X-ray photoelectron spectroscopy (XPS). The photooxidation process has been found to involve the oxidation of the thiolate group to a sulfonate by an active O2 species (possibly singlet oxygen). The rate of photooxidation was found to vary strongly with alkyl chain length and has been correlated with the amount of disorder within the monolayers. Short-chain SAMs (n ≤ 8) have the highest disorder and oxidize the fastest, with the rate of oxidation increasing sharply with decreasing n, while close packed long-chain SAMs (n ≥ 12) oxidize much more slowly, with the rate of oxidation decreasing slowly with increasing n.
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