Deep x-ray lithography processing for batch fabrication of thick polymer-based antenna structures

Abstract

Deep x-ray lithography is applied for the first time to fabricate polymer-based antenna structures with different portions of ceramic contents. To produce successful and viable antenna structures, three different methods are proposed using positive and negative tone resists. In the first method the structures are lithographically fabricated avoiding an intermediate molding step using SU-8 as a photosensitive resist filled with fine ceramic powder with particles in the submicron range. In the second and third methods a polymethylmethacrylate (PMMA) mold is first fabricated by x-ray lithography, and then SU-8/MMA mixed with the high ceramic powder content is injected into the mold. In these methods a final step of crosslinking for SU-8 and polymerization for MMA is also required. Optimized fabrication parameters allow the production of high quality antenna structures as thick as 2.3 mm. X-ray lithography capabilities in fabrication of antennas and other passive microwave components with special features reinforce the idea of fabricating integrated passive microwave circuits along with active circuits using this emerging technology.