Applied Physics Letters · 1994 · 97 citations · 10 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsOptoelectronicsSemiconductor MaterialsOptical Properties Of SemiconductorsSemiconductor Device MaterialsSemiconductor HeterostructuresSemiconductor PhysicsThermal Properties Of SemiconductorsWide-bandgap SemiconductorsActivation EnergyCarrier Recombination DynamicsDisordered SemiconductorsElectron ThermalizationNonradiative RecombinationPhotoluminescenceTemperature DependenceThermalization
The integrated photoluminescence (PL) intensities of both ordered and disordered epilayers of InGaP grown on GaAs have been measured as a function of temperature. The highest PL efficiency occurs in the most disordered sample. We find that the PL intensities can drop from 2 to almost 4 orders of magnitude between 12 and 280 K. The samples show an Arrhenius behavior characterized by two activation energies. Below 100 K the activation energies lie in the region of 10–20 meV. Above 100 K the activation energy is approximately 50 meV except in the most disordered sample where it increases to 260 meV. We conclude that the low-temperature PL efficiency is most likely controlled by carrier thermalization from spatial fluctuations of the band edges followed by nonradiative recombination. At higher temperatures the PL efficiency is dominated by a nonradiative path whose characteristic activation energy and transition probability depend upon the degree of sublattice ordering.
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Evidence for spatially indirect recombination in Ga0.52In0.48P
M. C. DeLong, W. D. Ohlsen, I. Viohl et al. · Journal of Applied Physics · 1991 · 91 citations