Publication | Closed Access
Secondary electron emission from boron-doped diamond under ion impact: Applications in single-ion detection
20
Citations
3
References
1997
Year
EngineeringMev He+Ion Beam InstrumentationVacuum DeviceIon ImplantationSecondary Electron EmissionElectron SpectroscopyIon BeamInstrumentationIon EmissionPhysicsThin Vacuum WindowAtomic PhysicsParticle Beam PhysicsBoron-doped DiamondDiamond-like CarbonNatural SciencesSpectroscopyApplied PhysicsThin-film WindowIon Impact
The secondary electron emission from a 2 μm thick boron-doped diamond film under ion (4.6–7.7 MeV He+)impact is reported. The yield under ions impact is found to be remarkably high, stable over a period of many months, and independent of which side of the film (i.e., growth or substrate side) is exposed to the ion flux. By taking advantage of the high secondary-electron yield, the passage of each ion through the film could be detected with an efficiency of close to 100%, which to the best of our knowledge is the highest efficiency recorded to date for any thin-film window. This finding has an immediate application in single-ion irradiation systems where a thin vacuum window is required to allow extraction of an ion beam from the vacuum into air and at the same time offer 100% efficiency for the detection of the passage of the ion through the window.
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