Publication | Closed Access

a-C:H thin films deposited by radio-frequency plasma: influence of gas composition on structure, optical properties and stress levels

Materials ScienceStress LevelsOptical MaterialsEngineeringOptical PropertiesNonthermal PlasmaApplied PhysicsThin FilmsGas Discharge PlasmaRadio-frequency PlasmaH Thin FilmsPlasma ProcessingPlasma Application