Publication | Closed Access
Study of Si(001) 2×1 domain conversion during direct current and radiative heatings
59
Citations
17
References
1992
Year
Domain ConversionRadiative Heat TransferEngineeringSilicon On InsulatorSemiconductor DeviceSemiconductor NanostructuresSemiconductorsElectronic DevicesConversion ProcessSemiconductor TechnologyElectrical EngineeringPhysicsCrystalline DefectsSemiconductor MaterialSemiconductor Device FabricationHeat TransferRadiative HeatingsSurface ScienceApplied PhysicsDiffusion AnisotropyDomain ConversionsThermal Engineering
Si(001) 2×1 domain conversions induced by sample electric current are observed using microprobe reflection high-energy electron diffraction. Samples are heated by using both direct current and a radiative heater. It is found that diffusion anisotropy of Si adatoms exists on 2×1 surfaces and that the domain conversion velocity is proportional to a voltage applied between the sample edges. This indicates that the conversion process is induced by the diffusion anisotropy and the electric force acting on positively charged adatoms. Minor 2×1 domain terraces always spread when the sample is heated radiatively. This preserves narrow 2×1 and 1×2 domain terraces after the conversion process and during Si growth process.
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