Realization and properties of YBa2Cu3O7−δ Josephson junctions by metal masked ion damage technique

Abstract

We have developed a simple process to fabricate high-TC Josephson junctions by a combination of focused ion beam milling and 100 keV H2+ ion implantation. The resistively shunted junction-like current–voltage characteristics were observed in the temperature range of 48 to 4.2 K. The devices showed clear dc and ac Josephson effects. This technique is very promising in terms of simplicity and flexibility of fabrication and has potential for high-density integration.