IEEE Journal of Quantum Electronics · 1983 · 47 citations · 7 references
EngineeringElectrical EngineeringMaterials ScienceOpticsOptoelectronicsPhotonicsLaser DiodesLaser Host MaterialsLaser OpticsLaser PhysicsOptical SourcesSemiconductor LasersFabricationFabrication ProcessesFar-field RadiationLaser ThresholdLasersLight-emitting MaterialsOptical Gain In SemiconductorsSemiconductor Laser Fabrication
We have succeeded in making a surface emitting (SE) GaInAsP/InP injection laser with short cavity length (= 10 μm) which operates at 1.22 μm of wavelength with threshold current of 160 mA at 77 K. No side emitting mode was observed as a result of preparing long absorbing regions and a small dot electrode (20 μm φ). Only one longitudinal SE mode dominated up to 1.7 times the threshold and the far-field radiation angle was sharp ( <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2\Delta\theta \approx 10\deg</tex> ). Fabrication processes and lasing condition are detailed.
7
GaInAsP/InP Surface Emitting Injection Lasers
H. Soda, Kenichi Iga, Chiyuki Kitahara et al. · Japanese Journal of Applied Physics · 1979 · 544 citations
LONGITUDINAL INJECTION-PLASMA LASER OF InSb
I. Melngailis · Applied Physics Letters · 1965 · 71 citations
Shigehisa Arai, Y. Suematsu, Y. Itaya · IEEE Journal of Quantum Electronics · 1980 · 69 citations