High rate and process control of reactive sputtering by gas pulsing: the Ti–O system - Concepedia

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High rate and process control of reactive sputtering by gas pulsing: the Ti–O system

43

Citations

24

References

2000

Year

Nicolas Martin, A Bally, P. Hones, R. Sanjinés, F. Lévy

Thin Solid Films

EngineeringHigh RateReactive SputteringPulse PowerGas Pulsing

References

	Year	Citations

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