Semiconducting nanocrystalline iron disilicide thin films prepared by pulsed-laser ablation

Abstract

Amorphous iron silicide was reported to be semiconducting as well as β-FeSi2, and it has received considerable attention from both the physical and engineering points of view. However, there have been few studies and its basic properties are still unknown. We could grow the semiconducting nanocrystalline iron disilicide thin films by pulsed-laser deposition using an FeSi2 target. They consist of crystallites with diameters ranging from 3 to 5 nm. The carrier density and the mobility at 300 K were 1.5×1019 cm−3 and 35 cm/V s, respectively.