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Photoluminescence in short-period Si/Ge strained-layer superlattices
197
Citations
22
References
1990
Year
Ii-vi SemiconductorElectrical EngineeringPhotoluminescenceEngineeringPhysicsLayer-thickness RatioNanoelectronicsEnergy Range 0.7Strain DistributionApplied PhysicsMolecular Beam EpitaxySilicon On InsulatorMicroelectronicsOptoelectronics
Photoluminescence has been observed in the energy range 0.7 to 0.9 eV in short-period Si/Ge strained-layer superlattices grown on Si(100) and Ge(100) substrates. The luminescence is strongly influenced by period, layer-thickness ratio, and strain distribution. The experimental results are in good agreement with the expected fundamental energy gaps of the superlattices as calculated with a Kronig-Penney--type model.
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