Structure/property/process relationships in chemical vapor deposition CVD

Abstract

Although chemical vapor deposition is capable of yielding a wide variety of materials in structures ranging from amorphous, to fine-grained, needle-like, single crystals, and epitaxial films, the structure/property/process relationships have received greatest attention for a limited number of materials whose economic and technological importance are most significant. The effects of temperature and effective supersaturation on the structure/property/process relationships are reviewed for semiconductor silicon, pyrolytic carbon, and CVD tungsten, for which extensive data are available. Suggestions are made for research in areas that would improve understanding of CVD and increase its range of applicability.