Publication | Closed Access
Properties of nitrogen doped silicon films deposited by low pressure chemical vapour deposition from disilane and ammonia
17
Citations
15
References
2002
Year
Materials ScienceEngineeringSurface ScienceApplied PhysicsSilicon FilmsSemiconductor Device FabricationThin FilmsSilicon On InsulatorChemical Vapor DepositionThin Film Processing
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