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Impact ionisation in multilayered heterojunction structures
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1980
Year
Materials ScienceIon ImplantationMultilayered HeterojunctionEngineeringBasic Bulk MaterialsPhysicsApplied PhysicsQuantum MaterialsCondensed Matter PhysicsBand-edge DiscontinuitiesSemiconductor MaterialIon EmissionCategoryiii-v SemiconductorIon StructureImpact Ionisation
Calculations are reported showing that in multilayered heterojunction structures the effective impact ionisation rates for electrons and holes can be very different, even if they are the same in the basic bulk materials. The reason for this is the difference in the band-edge discontinuities for electrons and holes and the lower phonon mean free path for holes in quantum well structures.