Epitaxial growth of oxide films (La–Ca–Mn–O and Y–Ba–Cu–O) by the facing-target sputtering technique

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	Year	Citations
Epitaxial growth of single-crystal (La,Ca)MnO3 thin films Xiaofei Zeng, H. K. Wong Applied Physics Letters EngineeringCrystal Growth TechnologyHalide PerovskitesPerovskite ModuleCeramic Thin Films	1995	57
An ultrahigh vacuum, magnetron sputtering system for the growth and analysis of nitride superlattices Paul B. Mirkarimi, M. Shinn, Scott A. Barnett Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceMagnetron Sputtering SystemBoron NitrideEngineeringPhysics	1992	50
Preparation of strontium titanate thin film on Si substrate by radio frequency magnetron sputtering Neung-Ho Cho, Seung-Hee Nam, Ho‐Gi Kim Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceSi SubstrateEngineeringRadio FrequencyCrystalline Defects	1992	18
Effect of process parameters on glow discharge and film thickness uniformity in facing target sputtering Siddhartha S. Nathan, G.K. Muralidhar, G. Mohan Rao, Thin Solid Films Electrical EngineeringTarget SputteringEngineeringProcess ParametersElectron-beam Lithography	1997	12

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