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Temperature-Dependent Current-Voltage Characteristics of Fully Processed Ba<sub>0.7</sub>Sr<sub>0.3</sub>TiO<sub>3</sub> Capacitors Integrated in a Silicon Device
43
Citations
12
References
1996
Year
EngineeringSilicon DeviceIntegrated CircuitsThin Film Process TechnologyInterconnect (Integrated Circuits)Semiconductor DeviceAdvanced Packaging (Semiconductors)Bypass CapacitorsDevice ModelingMaterials EngineeringElectrical EngineeringMaterials ScienceTemperature-dependent Current-voltage CharacteristicsSemiconductor Device FabricationMicroelectronicsFilm ThicknessApplied PhysicsThin FilmsThin Film Capacitors
Temperature-dependent current-voltage characteristics of fully processed Ba 0.7 Sr 0.3 TiO 3 thin film capacitors integrated in a charge-coupled device delay-line processor as bypass capacitors were studied. The thin film capacitors with a film thickness of 185 nm were formed by metal-organic decomposition processing. The leakage current measured after completion of the integration process was 1 to 2 orders of magnitude higher than that measured after capacitor patterning. The leakage current at low voltages (<1 V, 50 kV/cm) indicated ohmic conduction within a measured temperature range of 300–423 K. At high voltages (>10 V, 500 kV/cm), the Schottky mechanism plays a dominant role in leakage current, while the Frenkel-Poole emission begins to contribute to the leakage current as the temperature is elevated.
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