A comparison of NF3 and NH3 as the nitrogen sources for AIN crystal growth by metalorganic chemical vapor deposition

The Use of Metalorganics in the Preparation of Semiconductor Materials

H. M. Manasevit, F. M. Erdmann, W. I. Simpson · Journal of The Electrochemical Society · 1971 · 296 citations

Engineering, Chemistry, Materials Science +12

Epitaxial Growth of Aluminum Nitride on Sapphire Using Metalorganic Chemical Vapor Deposition

Mizuho Morita, Norihiko Uesugi, Seiji Isogai et al. · Japanese Journal of Applied Physics · 1981 · 129 citations

Natural Sciences, Materials Engineering, Materials Science +17

Low-Temperature Growth of Polycrystalline AlN Films by Microwave Plasma CVD

Yoshihiro Someno, Makoto Sasaki, Toshio Hirai · Japanese Journal of Applied Physics · 1990 · 25 citations

Natural Sciences, Materials Engineering, Materials Science +16

RF plasma synthesis of amorphous AIN powder and films

Moses David, S. V. Babu, Don H. Rasmussen · AIChE Journal · 1990 · 25 citations

Natural Sciences, Materials Engineering, Materials Science +16

Low temperature metal-organic chemical vapor deposition of aluminum nitride with nitrogen trifluoride as the nitrogen source

James H. Edgar, Zhongliang Yu, Akhter Ahmed et al. · Thin Solid Films · 1990 · 24 citations

Natural Sciences, Materials Engineering, Materials Science +14