Publication | Closed Access
Simulation of deep UV lithography with SU-8 resist by using 365 nm light source
22
Citations
3
References
2005
Year
PhotonicsEngineeringElectron-beam LithographyBeam LithographyMicrofabricationOptical PropertiesUv-vis SpectroscopyApplied PhysicsNm Light SourceSu-8 ResistDeep Uv LithographyMicroelectronicsOptoelectronicsNanolithography Method
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