Plasma chemistry during the deposition of a-C:H films and its influence on film properties - Concepedia

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Plasma chemistry during the deposition of a-C:H films and its influence on film properties

52

Citations

31

References

2003

Year

Jan Benedikt, R.V. Woen, S. L. M. van Mensfoort, V. Peřina, Joonhwa Hong, M. C. M. van de Sanden

Diamond and Related Materials

EngineeringFilm PropertiesNonthermal PlasmaSurface ScienceApplied PhysicsChemistryThin FilmsGas Discharge PlasmaH FilmsPlasma ProcessingChemical Vapor Deposition

References

	Year	Citations

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