Large Area Chemical Vapour Deposition of Diamond Particles and Films Using Magneto-Microwave Plasma

Abstract

Large area chemical vapour deposition of diamond has been obtained using magneto-microwave plasma. The important point of the developed system is to set the electron cyclotron resonance condition (875 G), where the highest plasma density is expected, at the deposition area by controlling the distribution of an applied magnetic field. Even in 10 Torr where complete electron gyrations cannot be expected, the size of the discharge area controlled by the magnetic field is 70-80 mm in diameter. This value is the largest of all plasma deposition systems of diamond. The crystallinity obtained by the above-mentioned plasma compares favourably with those of the best ones by previous methods.