Chemical vapor deposition of metals: Part 1. An overview of CVD processes

Abstract

Abstract The chemical vapor deposition (CVD) of metals is a rapidly developing area in which metal‐containing compounds are being synthesized as new precursors. This article reviews this area and discusses precursor design, reaction pathways, reactor types, and the influence of reactor operating conditions on film growth. We have gathered recent results for precursor design and CVD chemistry and show how analysis of results from CVD experiments can be used to assist in the development of new CVD precursors.