Electrical EngineeringIon ImplantationEngineeringPhysicsAtomic PhysicsIon BeamIon Source BeamInstrumentationGas Discharge PlasmaIon OpticsIon Emission
A 30 cm diameter argon ion source was evaluated. Ion source beam currents up to 4a were extracted with ion energies ranging from 0.2 to 1.5 KeV. An ion optics scaling relation was developed for predicting ion beam extraction capability as a function of total extraction voltage, gas type, and screen grid open area. Ignition and emission characteristics of several hollow cathode geometries were assessed for purposes of defining discharge chamber and neutralizer cathodes. Also presented are ion beam profile characteristics which exhibit broad beam capability well suited for ion beam sputtering applications.
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Advances in Electronics and Electron Physics
P.H. Batey · Optica Acta International Journal of Optics · 1973
278 citations
Ion-Beam Techniques for Device Fabrication
E. G. Spencer, P. H. Schmidt · Journal of Vacuum Science and Technology · 1971
Materials ScienceMaterials EngineeringElectrical Engineering+15
91 citations
Optimization of an electron-bombardment ion source for ion machining applications
P. D. Reader, H. R. Kaufman · Journal of Vacuum Science and Technology · 1975
29 citations
Performance and control of a 30-cm-diam, low-impulse, Kaufman thruster
R. BECHTEL · Journal of Spacecraft and Rockets · 1970
20 citations