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High contrast 3D proximity correction for electron-beam lithography: An enabling technique for the fabrication of suspended masks for complete device fabrication within an UHV environment

High Contrast 3DElectrical EngineeringEngineeringElectron-beam LithographyBeam LithographyMicrofabricationMicroscopyTarget FabricationApplied PhysicsElectron OpticInstrumentationElectronic PackagingMicroelectronicsProximity Correction3D PrintingNanolithography Method