Two-photon lithography in visible and NIR ranges using multibranched-based sensitizers for efficient acid generation

Ming Jin, Jianchao Xie, Jean‐Pierre Malval, Arnaud Spangenberg, Olivier Soppera, Davy‐Louis Versace, Tiffanie Leclerc, Haiyan Pan, Decheng Wan, Hongting Pu,

Journal of Materials Chemistry C · 2014 · 38 citations · 86 references

Concepts

Abstract

Branching effects lead to a cooperative enhancement of the two-photon absorption (2PA) in the NIR and visible ranges.

References

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