Publication | Closed Access
Voltage shifts of Fowler-Nordheim tunneling J-V plots in thin gate oxide MOS structures due to trapped charges
37
Citations
10
References
1989
Year
Electrical EngineeringVoltage ShiftsEngineeringPhysicsTunneling MicroscopyStress-induced Leakage CurrentOxide ElectronicsBias Temperature InstabilityApplied PhysicsCondensed Matter PhysicsJ-v PlotsMicroelectronicsThin GateSemiconductor Device
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