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Hall mobility analysis in low-temperature-grown molecular-beam epitaxial GaAs
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1996
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SemiconductorsRoom TemperatureSemiconductor TechnologyElectronic DevicesEngineeringPhysicsHall Effect MeasurementsApplied PhysicsQuantum MaterialsCondensed Matter PhysicsSemiconductor MaterialTemperature Dependent ConductivityMolecular Beam EpitaxyEpitaxial GrowthHall Mobility Analysis
Temperature dependent conductivity and Hall effect measurements were carried out on molecular-beam epitaxial GaAs layers grown at 200–420 °C and separated from the substrate. An analysis of experimental data with and without considering the hopping Hall mobility was made. An extremely low room temperature Hall mobility of 0.14 cm2 V−1 s−1 was measured in the 250 °C layer, which could be interpreted as the hopping Hall mobility. The room temperature band Hall mobility (μHb) increases from 500 to 6000 cm2 V−1 s−1 and the power (n) of the temperature dependence of μHb (∼T−n) increases from 0.5 to 1.2 with increasing growth temperature from 300 to 420 °C.