Publication | Closed Access
Deposition of Ba<sub>1−x</sub>Sr<sub>x</sub>TiO<sub>3</sub> and SrTiO<sub>3</sub> via liquid source CVD (LSCVD) for ULSI DRAMS
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Citations
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References
1994
Year
EngineeringThin Film Process TechnologyVacuum DeviceChemical DepositionSuperconductivityMolecular Beam EpitaxyEpitaxial GrowthThin Film ProcessingMaterials ScienceMaterials EngineeringLiquid Source CvdSemiconductor Device FabricationMicroelectronicsUlsi DramsSurface ScienceApplied PhysicsStrontium TitanateThin FilmsDeposition MachineChemical Vapor Deposition
Abstract In 1991 we demonstrated the use of a deposition machine that injected liquid sol-gel material into a vacuum chamber at room temperature for the production of high quality lead zirconate titanate (PZT) thin films. This year we have modified the machine to produce strontium titanate and barium strontium titanate films of sufficient quality for DRAM applications.
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