Publication | Closed Access
Chemical Vapor Deposition of Nickel Oxide Films from Bis-π-Cyclopentadienyl-Nickel
64
Citations
11
References
1997
Year
Materials ScienceMaterials EngineeringOptical MaterialsEngineeringNanotechnologyBis-π-cyclopentadienyl NickelSurface ScienceOptoelectronic MaterialsTransparent FilmOxide ElectronicsThin Film Process TechnologyChemistryThin FilmsChemical DepositionChemical Vapor DepositionNickel Oxide FilmsThin Film Processing
Bis-π-cyclopentadienyl nickel has been proposed as a source material for metalorganic chemical vapor deposition of nickel oxide films. The transparent film deposited at 310°C was of a NaCl-type crystal structure of NiO. The refractive index and optical bandgap were approximately 2.1 and 3.7 eV, respectively.
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