Journal of Vacuum Science and Technology · 1971 · 11 citations · 0 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesThin FilmsEpitaxial GrowthOptical Thin FilmsSemiconductor Device MaterialsSemiconductor Thin FilmsThin-film DepositionThin-film MaterialsCrystal Surface MorphologyEpitaxial Film GrowthEpitaxial MaterialsEpitaxial Thin FilmsMetal Sulfide Thin FilmsSemiconductor Electro-optic EffectsZinc Sulfides
A vacuum technique is described which permits the deposition of epitaxial films of ZnS in thicknesses up to 100 μ. Results of electron diffraction and observations of the surface morphology are described. The films can be used in devices which are based upon electro-optic effects.