Concepedia
Thin Solid Films · 1998 · 15 citations · 5 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsMaterials ChemistryMetallurgyAlloysIi-vi SemiconductorsIii-v SemiconductorsMetalsSemiconductor Device MaterialsThin Film OxidationPrecursor DesignTin ChemistryTin MetallurgyTin Oxides
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Synthesis of thin films by atmospheric pressure chemical vapor deposition using amido and imido titanium(IV) compounds as precursors
Renaud M. Fix, Roy G. Gordon, David M. Hoffman · Chemistry of Materials · 1990 · 177 citations
Natural Sciences, Chemistry, Materials Science +12
High-temperature contact structures for silicon semiconductor devices
M. Wittmer · Applied Physics Letters · 1980 · 111 citations
Engineering, Materials Engineering, Materials Science +17
TiN as a diffusion barrier in the Ti-Pt-Au beam-lead metal system
W.J. Garceau, P. R. Fournier, G.K. Herb · Thin Solid Films · 1979 · 58 citations
Natural Sciences, Materials Engineering, Materials Science +14
MOCVD of Titanium Nitride from a New Precursor, Ti[N(CH<sub>3</sub>)C<sub>2</sub>H<sub>5</sub>]<sub>4</sub>
Hyun‐Kook Shin, Hyun-Kook Shin, Jaegab Lee et al. · Chemistry of Materials · 1997 · 37 citations
Natural Sciences, Materials Engineering, Materials Science +17
Flow-Tube Kinetics of Gas-Phase Chemical Vapor Deposition Reactions: TiN from Ti(NMe2)4 and NH3
Bruce H. Weiller, Brenda V. Partido · Chemistry of Materials · 1994 · 20 citations
Natural Sciences, Chemistry, Materials Science +14