New Technique for Preparation of BiSrCaCuO Thin Films with T<sub>c</sub> of 100 K and Above

Masao Fukutomi, Junichi Machida, Yoshiaki Tanaka, Toshihisa Asano, Takashi Yamamoto, Hiroshi Maeda

Japanese Journal of Applied Physics · 1988 · 35 citations · 10 references

Concepts

Abstract

The successful growth of superconducting BiSrCaCuO thin films has been reported by a new process based on rf magnetron sputtering. The formation of a partially melted underlayer by controlling the substrate temperature during an early stage of the deposition process appeared to be responsible for a marked improvement in T c . A zero-resistance temperature of 100 K and above was achieved with very high reproducibility when the film was deposited on MgO(100) substrate using a target of Bi 1.3 Sr 1 Ca 1 Cu 1.5 O x followed by annealing at 875°C for 0.5 h.

References

10