Japanese Journal of Applied Physics · 1988 · 35 citations · 10 references
Natural SciencesMaterials EngineeringMaterials ScienceCondensed Matter PhysicsElectronic MaterialsThin FilmsSuperconducting MaterialsSuperconducting Thin FilmsThin Film AnnealingThin Film Electrical PropertiesThin-film DepositionThin-film MaterialsHigh-temperature Superconducting FilmsHigh-temperature SuperconductorsMagnetron SputteringSubstrate Temperature EffectsSubstrate Temperature ManagementSuperconducting PropertiesTemperature Dependence Of ResistanceThin-film Superconductors
The successful growth of superconducting BiSrCaCuO thin films has been reported by a new process based on rf magnetron sputtering. The formation of a partially melted underlayer by controlling the substrate temperature during an early stage of the deposition process appeared to be responsible for a marked improvement in T c . A zero-resistance temperature of 100 K and above was achieved with very high reproducibility when the film was deposited on MgO(100) substrate using a target of Bi 1.3 Sr 1 Ca 1 Cu 1.5 O x followed by annealing at 875°C for 0.5 h.
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Sputter Deposition of BiSrCaCuO Thin Films
Masao Fukutomi, Junichi Machida, Yoshiaki Tanaka et al. · Japanese Journal of Applied Physics · 1988 · 692 citations