Applied Physics Letters · 2003 · 72 citations · 16 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsDislocations In SemiconductorsLight-emitting DiodesP-n JunctionsSemiconductor Device MaterialsSemiconductor PhysicsWide Band Gap SemiconductorsAnnealingAnnealing Temperature EffectsDislocation CoresEnergy Dispersive X-ray SpectroscopyEnergy-dispersive X-ray SpectroscopyGallium NitrideThermal AnnealingThermal Annealing Effects
The effect of thermal annealing on current–voltage properties of GaN light emitting diodes (LEDs) has been studied. At annealing temperatures above 700 °C, the p–n junction of the diodes became very leaky and Ga-contained metallic bubbles were observed on the surface of Ni/Au p-ohmic contact. Transmission electron microscopy and energy dispersive x-ray spectrometer studies revealed that these metallic bubbles resided directly on top of the threading dislocations in GaN and both Ni and Au were indiffused into the LED structure along the cores of the TDs. The conducting paths formed by the metal containing dislocation cores are believed to be the cause for the observed short circuit behavior of p–n junctions at high annealing temperatures.
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S. J. Rosner, Elizabeth C. Carr, M. J. Ludowise et al. · Applied Physics Letters · 1997 · 530 citations
Natural Sciences, Materials Engineering, Materials Science +17
Very low resistance multilayer Ohmic contact to <i>n</i>-GaN
Zhifang Fan, S. Noor Mohammad, Wook Kim et al. · Applied Physics Letters · 1996 · 455 citations
Low resistance ohmic contacts on wide band-gap GaN
Mao Lin, Zhenqiang Ma, Fengyi Huang et al. · Applied Physics Letters · 1994 · 438 citations