Publication | Closed Access
Fabrication of carbon nanotube-based nanodevices using a combination technique of focused ion beam and plasma-enhanced chemical vapor deposition
26
Citations
10
References
2007
Year
EngineeringElectron-beam LithographyNanodevicesVacuum DevicePlasma ProcessingChemical EngineeringCarbon-based MaterialElectron MicroscopyNanoelectronicsNanodevice PrototypesHorizontal Carbon NanotubesIon BeamNanometrologyTransmission Electron MicroscopeCarbon NanotubesCarbon Nanotube-based NanodevicesMaterials ScienceElectrical EngineeringCombination TechniqueNanotechnologyFocused Ion BeamNanomaterialsApplied PhysicsElectron MicroscopeNanofabricationChemical Vapor Deposition
This study focuses on the fabrication of two nanodevice prototypes which utilized vertical and horizontal carbon nanotubes used the focused ion beam to localize the catalysts, followed by plasma-enhanced chemical vapor deposition. First, metal-gated carbon nanotube field emitter arrays were fabricated on multilayer substrates containing an imbedded catalyst layer. Second, horizontally aligned single-walled carbon nanotubes were grown on a transmission electron microscopy grid. This allows the carbon nanotubes to be directly analyzed in a transmission electron microscope. It is expected that the methodology introduced here will open up opportunities for the direct fabrication of carbon nanotube based nanodevices.
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