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Pulsed laser deposition of compact high adhesion polytetrafluoroethylene thin films
35
Citations
13
References
2002
Year
EngineeringLaser ApplicationsLaser DepositionThin Film Process TechnologyPolymer ProcessingFluorine DeficientPulsed Laser DepositionThin Film ProcessingTensile StrengthMaterials ScienceMaterials EngineeringNanomanufacturingLaser Processing TechnologyLaser-assisted Deposition3D PrintingAdvanced Laser ProcessingMicrofabricationMaterials CharacterizationApplied PhysicsPowder PelletsThin FilmsLaser-surface Interactions
Polytetrafluoroethylene (PTFE) thin films were prepared from pressed powder pellets via pulsed laser deposition by using ArF (193 nm) excimer laser. The applied laser fluences were in the 1.6-10 J cm-2 range, the substrate temperature was varied between 27°C and 250°C and post-annealing of the films was carried out in air at temperatures between 320°C and 500°C. Films deposited at 250°C substrate temperature were found to be stoichiometric while those prepared at lower temperatures were fluorine deficient. Morphological analyses proved that the film thickness did not significantly depend on the substrate temperature and the post annealing at 500°C resulted in a thickness reduction of approximately 50%. It was demonstrated that the films prepared at 8.2 J cm-2 fluence and annealed at 500°C followed by cooling at 1°C min-1 rate were compact, pinhole-free layers. The adherence of films to the substrates was determined by tensile strength measurements. Tensile strength values up to 2.4 MPa were obtained. These properties are of great significance when PTFE films are fabricated for the purpose of protecting coatings.
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